Comparison of Si(111) surfaces prepared using aqueous solutions of NH4F versus HF

Vacuum scanning tunneling microscopy has been used to investigate the hydrogen-terminated Si(111) surfaces obtained upon dissolution of the native oxide in HF and NH4F solutions. Whereas etching in aqueous HF acid produces an atomically rough surface, comparable treatment in NH4F results in atomical...

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Bibliographic Details
Published in:Applied physics letters 1991-04, Vol.58 (15), p.1656-1658
Main Authors: HIGASHI, G. S, BECKER, R. S, CHABAL, Y. J, BECKER, A. J
Format: Article
Language:English
Subjects:
Chemistry
Exact sciences and technology
General and physical chemistry
Surface physical chemistry
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Summary:Vacuum scanning tunneling microscopy has been used to investigate the hydrogen-terminated Si(111) surfaces obtained upon dissolution of the native oxide in HF and NH4F solutions. Whereas etching in aqueous HF acid produces an atomically rough surface, comparable treatment in NH4F results in atomically flat surfaces. These atomically flat surfaces are extremely well ordered and exhibit terraces which extend thousands of angstroms.
ISSN:0003-6951
1077-3118
DOI:10.1063/1.105155