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The N + Formation Mechanism of Vibrationally Selected N 2 O + Ions in the C 2 Σ + State: A TPEPICO Imaging Study
The N-NO bond fission of N O (C Σ ) ions can produce two major fragment ions, NO or N . In contrast to the dominant NO fragment ion, the N formation mechanism remains unclear to date. Here, dissociative photoionization of N O via the C Σ ionic state has been reinvestigated using a combined approach...
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Published in: | The journal of physical chemistry. A, Molecules, spectroscopy, kinetics, environment, & general theory Molecules, spectroscopy, kinetics, environment, & general theory, 2024-05 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites |
Online Access: | Get full text |
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Summary: | The N-NO bond fission of N
O
(C
Σ
) ions can produce two major fragment ions, NO
or N
. In contrast to the dominant NO
fragment ion, the N
formation mechanism remains unclear to date. Here, dissociative photoionization of N
O via the C
Σ
ionic state has been reinvestigated using a combined approach of threshold photoelectron-photoion coincidence (TPEPICO) velocity imaging and quantum chemical calculations. Accompanying the N
(
P) formation, the NO(X
Π) neutral fragment with low and high vi-rotational distributions was identified, based on the N
speed and angular distributions derived from the TPEPICO images. In particular, the excitation of the symmetric stretching ν
mode promotes the formation of high rotational components, while the asymmetric stretching ν
mode shows the exact opposite effect. According to our calculated multistate potential energy surfaces, intersystem crossing from C
Σ
to 1
Π exclusively provides feasible decomposition pathways to produce the N
fragment. In a slightly bent geometry, spin-orbit couplings between C
Σ
and two substates of 1
Π, 1
A' or 1
A″, play a crucial role in the N
formation from vibrationally selected N
O
(C
Σ
) ions. The mechanism also provides new insights into the charge transfer reaction of N
+ NO → N + NO
. |
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ISSN: | 1089-5639 1520-5215 |
DOI: | 10.1021/acs.jpca.4c00494 |