Effect of Mesoporous Silica as a Solid Precursor on the Properties of Silicon Oxycarbide Thin Films via Hot Filament Chemical Vapor Deposition

This study investigates the impact of mesoporous silica tablets on the synthesis and properties of silicon oxycarbide thin films produced via Hot Filament Chemical Vapor Deposition. Results reveal significant variations in composition and cluster morphology, influenced by the introduction of mesopor...

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Bibliographic Details
Published in:ChemistrySelect (Weinheim) 2024-03, Vol.9 (10), p.n/a
Main Authors: Garcia Balderas, Ivan Enrique, Ruiz, Crisoforo Morales, Andres, Enrique Rosendo, Perez Cruz, Maria Ana, Hernandez, Erick Gastellou, Galeazzi Isasmendi, Reina, Coyopol Solis, Antonio, García Salgado, Godofredo, Romano Trujillo, Roman
Format: Article
Language:English
Subjects:
chemical vapor deposition
mesoporous silica
photoluminescence
Silicon oxycarbide
tetraethoxysilane
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Summary:This study investigates the impact of mesoporous silica tablets on the synthesis and properties of silicon oxycarbide thin films produced via Hot Filament Chemical Vapor Deposition. Results reveal significant variations in composition and cluster morphology, influenced by the introduction of mesoporous silica tablets. The study demonstrates controlled deposition, consistent synthesis, and the substantial impact of mesoporous silica tablets on the composition, structure, and optical properties of thin films. These findings offer new possibilities for tailor design applications in electronics, optics, and sensors. Silicon oxycarbide thin films are prepared by Hot Filament Chemical Vapor Deposition, using mesoporous silica and Tetraethyl orthosilicate as precursors. A comprehensive analysis is conducted to elucidate the influence of mesoporous silica as a precursor on the properties of the resulting thin films. The study aims to discern and characterize the structural, morphological, and compositional properties of the thin films.
ISSN:2365-6549
2365-6549
DOI:10.1002/slct.202305119