Design of a positive resist for projection lithography in the mid-UV

The design, synthesis, formulation, and process optimization of a new mid‐UV resist are described. The synthesis of a spectrally matched sensitizer was guided by semiempirical quantum mechanical calculations that predict the effect of structural changes on optical absorption characteristics. The for...

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Bibliographic Details
Published in:Polymer engineering and science 1983-12, Vol.23 (18), p.1004-1011
Main Authors: Willson, Grant, Miller, Robert, McKean, Dennis, Clecak, Nicholas, Tompkins, Terry, Hofer, Donald, Michl, Josef, Downing, John
Format: Article
Language:English
Subjects:
Applied sciences
Exact sciences and technology
Physical properties
Polymer industry, paints, wood
Properties and testing
Radiation influence
Technology of polymers
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Summary:The design, synthesis, formulation, and process optimization of a new mid‐UV resist are described. The synthesis of a spectrally matched sensitizer was guided by semiempirical quantum mechanical calculations that predict the effect of structural changes on optical absorption characteristics. The formulation was guided by computer profile simulation studies and the process development by a response surface analytical procedure. These techniques allowed formulation optimization to be achieved on the basis of an understanding of the complex interactions between the resist dissolution response functions and the modulation transfer function of the exposure tool for which the resist was designed.
ISSN:0032-3888
1548-2634
DOI:10.1002/pen.760231806