Work-related factors associated with occupational exposure to static magnetic stray fields from MRI scanners: Factors Affecting SMF Exposure from MRI Scanners

Saved in:
Bibliographic Details
Published in:Magnetic resonance in medicine 2016-05, Vol.75 (5), p.2141-2155
Main Authors: Schaap, Kristel, Christopher-De Vries, Yvette, Cambron-Goulet, Évelyne, Kromhout, Hans
Format: Article
Language:English
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:
ISSN:0740-3194
DOI:10.1002/mrm.25720