Radical-Functionalised Gel: A Building-Block Strategy for Magnetochiral Assembly

A chiral organogelating scaffold is functionalised with a stable organic radical pendant. The morphology and spectroscopic properties of the gels are investigated as a function of the organogelator concentration and temperature. The combination of AFM and ESR spectroscopy provides firm evidence that...

Full description

Saved in:
Bibliographic Details
Published in:ChemPlusChem (Weinheim, Germany) Germany), 2013-02, Vol.78 (2), p.149-156
Main Authors: Mannini, Matteo, Cicchi, Stefano, Berti, Debora, Caneschi, Andrea, Brandi, Alberto, Lascialfari, Luisa, Sorace, Lorenzo
Format: Article
Language:English
Subjects:
chirality
ESR spectroscopy
gels
radicals
self-assembly
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:A chiral organogelating scaffold is functionalised with a stable organic radical pendant. The morphology and spectroscopic properties of the gels are investigated as a function of the organogelator concentration and temperature. The combination of AFM and ESR spectroscopy provides firm evidence that the architecture responsible for the formation of the macroscopic gel (i.e., the fibrillar structure) is maintained below the gelling concentration. This opens relevant perspectives in terms of the realisation of complex supramolecular chiral structures incorporating paramagnetic functions, and demonstrates that the ESR technique is suitable as a fast and direct check of the sample state (gel, solution, or small aggregates). A radically new gel: AFM and ESR spectroscopic studies are used to investigate a radical‐functionalised gel and the gelation process (see graph). The analyses also provide evidence that the fibrillar structure is maintained below the gelling concentration. This opens relevant perspectives in terms of the realization of complex supramolecular chiral structures incorporating paramagnetic functions.
ISSN:2192-6506
2192-6506
DOI:10.1002/cplu.201200250