Solution Processing of Topochemically Converted Layered WO 3 for Multifunctional Applications

Abstract Solution processing of nanomaterials is a promising technique for use in various applications owing to its simplicity and scalability. However, the studies on liquid‐phase exfoliation (LPE) of tungsten oxide (WO 3 ) are limited, unlike others, by a lack of commercial availability of bulk WO...

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Published in:Chemistry : a European journal 2021-08, Vol.27 (44), p.11326-11334
Main Authors: Sahoo, Priyabrata, Gupta, Bikesh, Chandra Sahoo, Ramesh, Vankayala, Kiran, Ramakrishna Matte, H. S. S.
Format: Article
Language:English
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Summary:Abstract Solution processing of nanomaterials is a promising technique for use in various applications owing to its simplicity and scalability. However, the studies on liquid‐phase exfoliation (LPE) of tungsten oxide (WO 3 ) are limited, unlike others, by a lack of commercial availability of bulk WO 3 with layered structures. Herein, a one‐step topochemical synthesis approach to obtain bulk layered WO 3 from commercially available layered tungsten disulfide (WS 2 ) by optimizing various parameters like reaction time and temperature is reported. Detailed microscopic and spectroscopic techniques confirmed the conversion process. Further, LPE was carried out on topochemically converted bulk layered WO 3 in 22 different solvents; among the solvents studied, the propan‐2‐ol/water (1 : 1) co‐solvent system appeared to be the best. This indicates that the possible values of surface tension and Hansen solubility parameters for bulk WO 3 could be close to that of the co‐solvent system. The obtained WO 3 dispersions in a low‐boiling‐point solvent enable thin films of various thickness to be fabricated by using spray coating. The obtained thin films were used as active materials in supercapacitors without any conductive additives/binders and exhibited an areal capacitance of 31.7 mF cm −2 at 5 mV s −1 . Photo‐electrochemical measurements revealed that these thin films can also be used as photoanodes for photo‐electrochemical water oxidation.
ISSN:0947-6539
1521-3765
DOI:10.1002/chem.202100751