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Photoelectron "Bridge" in Van Der Waals Heterojunction for Enhanced Photocatalytic CO 2 Conversion Under Visible Light
Constructing Van der Waals heterojunction is a crucial strategy to achieve excellent photocatalytic activity. However, in most Van der Waals heterojunctions synthesized by ex situ assembly, electron transfer encounters huge hindrances at the interface between the two components due to the large spac...
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Published in: | Advanced materials (Weinheim) 2023-09, Vol.35 (38), p.e2303047 |
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Main Authors: | , , , , , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Constructing Van der Waals heterojunction is a crucial strategy to achieve excellent photocatalytic activity. However, in most Van der Waals heterojunctions synthesized by ex situ assembly, electron transfer encounters huge hindrances at the interface between the two components due to the large spacing and potential barrier. Herein, a phosphate-bridged Van der Waals heterojunction of cobalt phthalocyanine (CoPc)/tungsten disulfide (WS
) bridged by phosphate (xCoPc-nPO
-WS
) is designed and prepared by the traditional wet chemistry method. By introducing a small phosphate molecule into the interface of CoPc and WS
, creates an electron "bridge", resulting in a compact combination and eliminating the space barrier. Therefore, the phosphate (PO
) bridge can serve as an efficient electron transfer channel in heterojunction and can efficiently transmit photoelectrons from WS
to CoPc under excited states. These excited photoelectrons are captured by the catalytic central Co
in CoPc and subsequently convert CO
molecules into CO and CH
products, achieving 17-fold enhancement on the 3CoPc-0.6PO
-WS
sample compared to that of pure WS
. Introducing a small molecule "bridge" to create an electron transfer channel provides a new perspective in designing efficient photocatalysts for photocatalytic CO
reduction into valuable products. |
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ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.202303047 |