Degradation of ferroelectric and weak ferromagnetic properties of BiFeO3 films due to the diffusion of silicon atoms

Crystalline BiFeO3 （BFO） films each with a crystal structure of a distorted rhombohedral perovskite are characterized by X-ray diffraction （XRD） and high-resolution electron microscopy （HRTEM）. The diffusion of silicon atoms from the substrate into the BiFeO3 film is detected by Rutherford backscatt...

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Published in:中国物理B：英文版 2014-07 (7), p.712-716
Main Author: Xiao Ren-Zheng Zhang Zao-Di Vasiliy O. Pelenovich Wang Ze-Song Zhang Rui Li Hui Liu Yong Huang Zhi-Hong Fu De-Jun
Format: Article
Language:English
Subjects:
X射线光电子能谱
性能退化
扩散法
硅原子
薄膜
铁电体
铁磁性
高分辨电子显微镜
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Summary:Crystalline BiFeO3 （BFO） films each with a crystal structure of a distorted rhombohedral perovskite are characterized by X-ray diffraction （XRD） and high-resolution electron microscopy （HRTEM）. The diffusion of silicon atoms from the substrate into the BiFeO3 film is detected by Rutherford backscattering spectrometry （RBS）. The element analysis is per- formed by energy dispersive X-ray spectroscopy （EDS）. Simulation results of RBS spectrum show a visualized distribution of silicon. X-ray photoelectron spectroscopy （XPS） indicates that a portion of silica is formed in the diffusion process of silicon atoms. Ferroelectric and weak ferromagnetic properties of the BFO films are degraded due to the diffusion of silicon atoms. The saturation magnetization decreases from 6.11 down to 0.75 emu/g, and the leakage current density increases from 3.8 × 10^-4 upto7.1 × 10^-4 A/cm-2.
ISSN:1674-1056
2058-3834
DOI:10.1088/1674-1056/23/7/077504