Silicon Carbon-Nitride (SiCxNy:H) by High Target Utilisation System (HiTUS) for crystalline silicon solar cell anti-reflective coating and passivation
SiCxNy:H films were deposited as anti-reflective (ARC)– passivation layers on crystalline silicon photovoltaics. The thin films were deposited using a remote plasma sputtering system HiTUS (High Target Utilisation Sputtering). The HiTUS allows the deposition of SiCxNy:H avoiding the use of pyrophori...
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| Main Authors: | , , , , |
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| Format: | Default Conference proceeding |
| Published: |
2011
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| Subjects: | |
| Online Access: | https://hdl.handle.net/2134/14668 |
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