Transmission through optically generated inductive grid arrays
A technique is developed for generating pseudometallic plasma inductive grid arrays within a semiconductor wafer. The induced plasma elements are defined by a surface impedance which is discussed. Results of an investigation into the transmission properties of a variety of array designs between 16 a...
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Main Authors: | , , |
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Format: | Default Article |
Published: |
1999
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Subjects: | |
Online Access: | https://hdl.handle.net/2134/9451 |
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