Transmission through optically generated inductive grid arrays

A technique is developed for generating pseudometallic plasma inductive grid arrays within a semiconductor wafer. The induced plasma elements are defined by a surface impedance which is discussed. Results of an investigation into the transmission properties of a variety of array designs between 16 a...

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Bibliographic Details
Main Authors: David S. Lockyer, J. C. Vardaxoglou, Michael J. Kearney
Format: Default Article
Published: 1999
Subjects:
Online Access:https://hdl.handle.net/2134/9451
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