Dusty plasmas : physics, chemistry, and technological impacts in plasma processing / edited by André Bouchoule. physics, chemistry, and technological impacts in plasma processing /
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| Other Authors: | |
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| Format: | Book |
| Language: | English |
| Published: |
Chichester :
Wiley,
c1999
|
| Subjects: | |
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| 245 | 0 | 0 | |a Dusty plasmas : |b physics, chemistry, and technological impacts in plasma processing / |c edited by André Bouchoule. |
| 260 | |a Chichester : |b Wiley, |c c1999 | ||
| 300 | |a viii, 408p : |b ill. ; |c 24cm | ||
| 504 | |a Includes bibliographical references and indexes | ||
| 650 | 0 | 0 | |a Plasma engineering |
| 650 | 0 | 0 | |a Plasma (Ionized gases) |x Industrial applications |
| 650 | 0 | 0 | |a Dusty plasmas |
| 650 | 0 | 0 | |a Plasma chemistry |
| 650 | 0 | 0 | |a Plasma-enhanced chemical vapor deposition |
| 700 | 1 | |a Bouchoule, André | |
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