Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme

We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measu...

Full description

Saved in:
Bibliographic Details
Published in:Optics express 2022-09, Vol.30 (20), p.35671-35683
Main Authors: Abel, Johann J., Wiesner, Felix, Nathanael, Jan, Reinhard, Julius, Wünsche, Martin, Schmidl, Gabriele, Gawlik, Annett, Hübner, Uwe, Plentz, Jonathan, Rödel, Christian, Paulus, Gerhard G., Fuchs, Silvio
Format: Article
Language:English
Citations: Items that this one cites
Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
cited_by cdi_FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063
cites cdi_FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063
container_end_page 35683
container_issue 20
container_start_page 35671
container_title Optics express
container_volume 30
creator Abel, Johann J.
Wiesner, Felix
Nathanael, Jan
Reinhard, Julius
Wünsche, Martin
Schmidl, Gabriele
Gawlik, Annett
Hübner, Uwe
Plentz, Jonathan
Rödel, Christian
Paulus, Gerhard G.
Fuchs, Silvio
description We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L 2/3 absorption edge in α -Al 2 O 3 and compare the results to synchrotron measurements.
doi_str_mv 10.1364/OE.463216
format article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_2726411643</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2726411643</sourcerecordid><originalsourceid>FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063</originalsourceid><addsrcrecordid>eNpNkD1PwzAQhi0EEqUw8A88wpBix06cjFUVPqRKXShr5DiXxiixiy9BMPDfSVQGprvTPffo9BJyy9mKi1Q-7IqVTEXM0zOy4CyXkWSZOv_XX5IrxHfGuFS5WpCfdYW-Gwegxf6NBmg6MIP9tMM37UHjGKAHNyAd0boD1bQKXteVdjVt7aGNWh1676yh6MdggM4L7ah1FO0w0vmoAwpfRz-rZj8EcBOIpp3M1-Si0R3CzV9dkv1j8bp5jra7p5fNehsZIdQQGS5MkuiGs4ZlSZJwMEokDVOmTiFvZJ0pWTVKKYiB5bwy05xlnGmha1GxVCzJ3cl7DP5jBBzK3qKBrtMO_IhlrOJUcp5KMaH3J9QEjzg9XB6D7XX4Ljkr54jLXVGeIha_i25wCw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2726411643</pqid></control><display><type>article</type><title>Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme</title><source>Free E-Journal (出版社公開部分のみ）</source><creator>Abel, Johann J. ; Wiesner, Felix ; Nathanael, Jan ; Reinhard, Julius ; Wünsche, Martin ; Schmidl, Gabriele ; Gawlik, Annett ; Hübner, Uwe ; Plentz, Jonathan ; Rödel, Christian ; Paulus, Gerhard G. ; Fuchs, Silvio</creator><creatorcontrib>Abel, Johann J. ; Wiesner, Felix ; Nathanael, Jan ; Reinhard, Julius ; Wünsche, Martin ; Schmidl, Gabriele ; Gawlik, Annett ; Hübner, Uwe ; Plentz, Jonathan ; Rödel, Christian ; Paulus, Gerhard G. ; Fuchs, Silvio</creatorcontrib><description>We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L 2/3 absorption edge in α -Al 2 O 3 and compare the results to synchrotron measurements.</description><identifier>ISSN: 1094-4087</identifier><identifier>EISSN: 1094-4087</identifier><identifier>DOI: 10.1364/OE.463216</identifier><language>eng</language><ispartof>Optics express, 2022-09, Vol.30 (20), p.35671-35683</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063</citedby><cites>FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063</cites><orcidid>0000-0001-5352-9205</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,786,790,27957,27958</link.rule.ids></links><search><creatorcontrib>Abel, Johann J.</creatorcontrib><creatorcontrib>Wiesner, Felix</creatorcontrib><creatorcontrib>Nathanael, Jan</creatorcontrib><creatorcontrib>Reinhard, Julius</creatorcontrib><creatorcontrib>Wünsche, Martin</creatorcontrib><creatorcontrib>Schmidl, Gabriele</creatorcontrib><creatorcontrib>Gawlik, Annett</creatorcontrib><creatorcontrib>Hübner, Uwe</creatorcontrib><creatorcontrib>Plentz, Jonathan</creatorcontrib><creatorcontrib>Rödel, Christian</creatorcontrib><creatorcontrib>Paulus, Gerhard G.</creatorcontrib><creatorcontrib>Fuchs, Silvio</creatorcontrib><title>Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme</title><title>Optics express</title><description>We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L 2/3 absorption edge in α -Al 2 O 3 and compare the results to synchrotron measurements.</description><issn>1094-4087</issn><issn>1094-4087</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNpNkD1PwzAQhi0EEqUw8A88wpBix06cjFUVPqRKXShr5DiXxiixiy9BMPDfSVQGprvTPffo9BJyy9mKi1Q-7IqVTEXM0zOy4CyXkWSZOv_XX5IrxHfGuFS5WpCfdYW-Gwegxf6NBmg6MIP9tMM37UHjGKAHNyAd0boD1bQKXteVdjVt7aGNWh1676yh6MdggM4L7ah1FO0w0vmoAwpfRz-rZj8EcBOIpp3M1-Si0R3CzV9dkv1j8bp5jra7p5fNehsZIdQQGS5MkuiGs4ZlSZJwMEokDVOmTiFvZJ0pWTVKKYiB5bwy05xlnGmha1GxVCzJ3cl7DP5jBBzK3qKBrtMO_IhlrOJUcp5KMaH3J9QEjzg9XB6D7XX4Ljkr54jLXVGeIha_i25wCw</recordid><startdate>20220926</startdate><enddate>20220926</enddate><creator>Abel, Johann J.</creator><creator>Wiesner, Felix</creator><creator>Nathanael, Jan</creator><creator>Reinhard, Julius</creator><creator>Wünsche, Martin</creator><creator>Schmidl, Gabriele</creator><creator>Gawlik, Annett</creator><creator>Hübner, Uwe</creator><creator>Plentz, Jonathan</creator><creator>Rödel, Christian</creator><creator>Paulus, Gerhard G.</creator><creator>Fuchs, Silvio</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0001-5352-9205</orcidid></search><sort><creationdate>20220926</creationdate><title>Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme</title><author>Abel, Johann J. ; Wiesner, Felix ; Nathanael, Jan ; Reinhard, Julius ; Wünsche, Martin ; Schmidl, Gabriele ; Gawlik, Annett ; Hübner, Uwe ; Plentz, Jonathan ; Rödel, Christian ; Paulus, Gerhard G. ; Fuchs, Silvio</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Abel, Johann J.</creatorcontrib><creatorcontrib>Wiesner, Felix</creatorcontrib><creatorcontrib>Nathanael, Jan</creatorcontrib><creatorcontrib>Reinhard, Julius</creatorcontrib><creatorcontrib>Wünsche, Martin</creatorcontrib><creatorcontrib>Schmidl, Gabriele</creatorcontrib><creatorcontrib>Gawlik, Annett</creatorcontrib><creatorcontrib>Hübner, Uwe</creatorcontrib><creatorcontrib>Plentz, Jonathan</creatorcontrib><creatorcontrib>Rödel, Christian</creatorcontrib><creatorcontrib>Paulus, Gerhard G.</creatorcontrib><creatorcontrib>Fuchs, Silvio</creatorcontrib><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Optics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Abel, Johann J.</au><au>Wiesner, Felix</au><au>Nathanael, Jan</au><au>Reinhard, Julius</au><au>Wünsche, Martin</au><au>Schmidl, Gabriele</au><au>Gawlik, Annett</au><au>Hübner, Uwe</au><au>Plentz, Jonathan</au><au>Rödel, Christian</au><au>Paulus, Gerhard G.</au><au>Fuchs, Silvio</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme</atitle><jtitle>Optics express</jtitle><date>2022-09-26</date><risdate>2022</risdate><volume>30</volume><issue>20</issue><spage>35671</spage><epage>35683</epage><pages>35671-35683</pages><issn>1094-4087</issn><eissn>1094-4087</eissn><notes>ObjectType-Article-1</notes><notes>SourceType-Scholarly Journals-1</notes><notes>ObjectType-Feature-2</notes><notes>content type line 23</notes><abstract>We present a tabletop setup for extreme ultraviolet (EUV) reflection spectroscopy in the spectral range from 40 to 100 eV by using high-harmonic radiation. The simultaneous measurements of reference and sample spectra with high energy resolution provide precise and robust absolute reflectivity measurements, even when operating with spectrally fluctuating EUV sources. The stability and sensitivity of EUV reflectivity measurements are crucial factors for many applications in attosecond science, EUV spectroscopy, and nano-scale tomography. We show that the accuracy and stability of our in situ referencing scheme are almost one order of magnitude better in comparison to subsequent reference measurements. We demonstrate the performance of the setup by reflective near-edge x-ray absorption fine structure measurements of the aluminum L 2/3 absorption edge in α -Al 2 O 3 and compare the results to synchrotron measurements.</abstract><doi>10.1364/OE.463216</doi><tpages>13</tpages><orcidid>https://orcid.org/0000-0001-5352-9205</orcidid><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 1094-4087
ispartof Optics express, 2022-09, Vol.30 (20), p.35671-35683
issn 1094-4087
1094-4087
language eng
recordid cdi_proquest_miscellaneous_2726411643
source Free E-Journal (出版社公開部分のみ）
title Absolute EUV reflectivity measurements using a broadband high-harmonic source and an in situ single exposure reference scheme
url http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-09-22T04%3A34%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Absolute%20EUV%20reflectivity%20measurements%20using%20a%20broadband%20high-harmonic%20source%20and%20an%20in%20situ%20single%20exposure%20reference%20scheme&rft.jtitle=Optics%20express&rft.au=Abel,%20Johann%20J.&rft.date=2022-09-26&rft.volume=30&rft.issue=20&rft.spage=35671&rft.epage=35683&rft.pages=35671-35683&rft.issn=1094-4087&rft.eissn=1094-4087&rft_id=info:doi/10.1364/OE.463216&rft_dat=%3Cproquest_cross%3E2726411643%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c337t-c13c55af10f085551ec735f07cd6e9f4d874bf777e2e091bc8748810a3ad3b063%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2726411643&rft_id=info:pmid/&rfr_iscdi=true