Carbon nitride — prospects for ultimate performance of superhard materials

In order to deposit thin solid films containing covalently bonded carbon nitride as a major matrix component, several different techniques for deposition were explored. They included reactive pulsed laser deposition, reactive DC magnetron sputtering and laser ablation of a frozen ethanol/liquid N 2...

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Bibliographic Details
Published in:Applied surface science 1996-02, Vol.92 (1-4), p.656-659
Main Authors: Uglov, S.A., Shub, V.E., Beloglazov, A.A., Konov, V.I.
Format: Article
Language:English
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Summary:In order to deposit thin solid films containing covalently bonded carbon nitride as a major matrix component, several different techniques for deposition were explored. They included reactive pulsed laser deposition, reactive DC magnetron sputtering and laser ablation of a frozen ethanol/liquid N 2 double layer system. Surface analysis techniques showed that the concentrations of nitrogen were as high as 20 to 25 at% in the bulk and up to 40 at% in the upper layers of the resulting a-C a-CN x films. The covalent bond of nitrogen to carbon was identified. It is similar to the nitrogen bonds in silicon nitride and boron nitride.
ISSN:0169-4332
1873-5584
DOI:10.1016/0169-4332(95)00313-4