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Influence of deposition time on the visible-light-driven photocatalytic activity of Cu2O thin films by reactive sputtering at room temperature
•Single-phase Cu2O thin films are deposited by reactive RF magnetron sputtering.•The films are sputtered at various deposition time from 1 min to 5 min.•The physical and chemical characterization of deposited Cu2O thin films are studied.•Photodegradation of crystal violet by Cu2O thin film are repor...
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| Published in: | Materials letters 2021-02, Vol.284, p.128980, Article 128980 |
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| Main Authors: | , , , |
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| Language: | English |
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| cited_by | cdi_FETCH-LOGICAL-c400t-fc21489eebbaca238b23e702457426b44aef067c1f1164a788514f1ab116af7d3 |
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| cites | cdi_FETCH-LOGICAL-c400t-fc21489eebbaca238b23e702457426b44aef067c1f1164a788514f1ab116af7d3 |
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| container_start_page | 128980 |
| container_title | Materials letters |
| container_volume | 284 |
| creator | Sai Guru Srinivasan, S. Govardhanan, B. Ashok, M. Santhosh Kumar, M.C. |
| description | •Single-phase Cu2O thin films are deposited by reactive RF magnetron sputtering.•The films are sputtered at various deposition time from 1 min to 5 min.•The physical and chemical characterization of deposited Cu2O thin films are studied.•Photodegradation of crystal violet by Cu2O thin film are reported for the first time.•The films sputtered at lower deposition time exhibit enhanced photocatalytic activity.
Nanocrystalline single-phase Cu2O thin films were deposited on a glass substrate by radio frequency (RF) reactive sputtering at room temperature with various deposition time of 1, 3 and 5 min. Films are in the cubic crystalline phase. Crystallite size increases from 16 to 22 nm and the surface roughness also found to increase from 1.8 to 2.3 nm with deposition time. XPS results denote that the defects in the films at lower deposition time predominantly attributed to oxygen vacancy. Optical band gap is found to decrease from 2.54 to 2.12 eV. The films were subjected to photocatalytic degradation of organic pollutant crystal violet. Cu2O thin films showed an excellent photocatalytic activity under visible light irradiation. Films sputtered at the lowest deposition time of 1 min exhibited higher degradation efficiency of 94%. |
| doi_str_mv | 10.1016/j.matlet.2020.128980 |
| format | article |
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Nanocrystalline single-phase Cu2O thin films were deposited on a glass substrate by radio frequency (RF) reactive sputtering at room temperature with various deposition time of 1, 3 and 5 min. Films are in the cubic crystalline phase. Crystallite size increases from 16 to 22 nm and the surface roughness also found to increase from 1.8 to 2.3 nm with deposition time. XPS results denote that the defects in the films at lower deposition time predominantly attributed to oxygen vacancy. Optical band gap is found to decrease from 2.54 to 2.12 eV. The films were subjected to photocatalytic degradation of organic pollutant crystal violet. Cu2O thin films showed an excellent photocatalytic activity under visible light irradiation. Films sputtered at the lowest deposition time of 1 min exhibited higher degradation efficiency of 94%.</description><identifier>ISSN: 0167-577X</identifier><identifier>EISSN: 1873-4979</identifier><identifier>DOI: 10.1016/j.matlet.2020.128980</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Catalytic activity ; Copper oxides ; Crystal defects ; Crystal violet ; Crystallites ; Cu2O thin film ; Deposition ; Glass substrates ; Light irradiation ; Materials science ; Photocatalysis ; Photodegradation ; Pollutants ; Radio frequency ; Reactive sputtering ; Room temperature ; Sputtering ; Surface roughness ; Thin films</subject><ispartof>Materials letters, 2021-02, Vol.284, p.128980, Article 128980</ispartof><rights>2020 Elsevier B.V.</rights><rights>Copyright Elsevier BV Feb 1, 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c400t-fc21489eebbaca238b23e702457426b44aef067c1f1164a788514f1ab116af7d3</citedby><cites>FETCH-LOGICAL-c400t-fc21489eebbaca238b23e702457426b44aef067c1f1164a788514f1ab116af7d3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>315,783,787,27936,27937</link.rule.ids></links><search><creatorcontrib>Sai Guru Srinivasan, S.</creatorcontrib><creatorcontrib>Govardhanan, B.</creatorcontrib><creatorcontrib>Ashok, M.</creatorcontrib><creatorcontrib>Santhosh Kumar, M.C.</creatorcontrib><title>Influence of deposition time on the visible-light-driven photocatalytic activity of Cu2O thin films by reactive sputtering at room temperature</title><title>Materials letters</title><description>•Single-phase Cu2O thin films are deposited by reactive RF magnetron sputtering.•The films are sputtered at various deposition time from 1 min to 5 min.•The physical and chemical characterization of deposited Cu2O thin films are studied.•Photodegradation of crystal violet by Cu2O thin film are reported for the first time.•The films sputtered at lower deposition time exhibit enhanced photocatalytic activity.
Nanocrystalline single-phase Cu2O thin films were deposited on a glass substrate by radio frequency (RF) reactive sputtering at room temperature with various deposition time of 1, 3 and 5 min. Films are in the cubic crystalline phase. Crystallite size increases from 16 to 22 nm and the surface roughness also found to increase from 1.8 to 2.3 nm with deposition time. XPS results denote that the defects in the films at lower deposition time predominantly attributed to oxygen vacancy. Optical band gap is found to decrease from 2.54 to 2.12 eV. The films were subjected to photocatalytic degradation of organic pollutant crystal violet. Cu2O thin films showed an excellent photocatalytic activity under visible light irradiation. Films sputtered at the lowest deposition time of 1 min exhibited higher degradation efficiency of 94%.</description><subject>Catalytic activity</subject><subject>Copper oxides</subject><subject>Crystal defects</subject><subject>Crystal violet</subject><subject>Crystallites</subject><subject>Cu2O thin film</subject><subject>Deposition</subject><subject>Glass substrates</subject><subject>Light irradiation</subject><subject>Materials science</subject><subject>Photocatalysis</subject><subject>Photodegradation</subject><subject>Pollutants</subject><subject>Radio frequency</subject><subject>Reactive sputtering</subject><subject>Room temperature</subject><subject>Sputtering</subject><subject>Surface roughness</subject><subject>Thin films</subject><issn>0167-577X</issn><issn>1873-4979</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNp9kMFq3DAQhkVpodu0b5CDIGdvJVm7si-BsrRpIJBLC70JWR5lZ7EtVxov7Ev0maOte-5p0PD9v5iPsVsptlLI_efTdnQ0AG2VUGWlmrYRb9hGNqaudGvat2xTMFPtjPn1nn3I-SSE0K3QG_bncQrDApMHHgPvYY4ZCePECceyKvMI_IwZuwGqAV-OVPUJzzDx-RgpekduuBB67jzhGelyrTks6rkEceIBhzHz7sIT_AWA53khgoTTC3fEU4wjJxhnSI6WBB_Zu-CGDJ_-zRv289vXH4fv1dPzw-Phy1PltRBUBa-kblqArnPeqbrpVA1GKL0zWu07rR0EsTdeBin32pmm2UkdpOvK0wXT1zfsbu2dU_y9QCZ7ikuaypdW6YKrWtZtofRK-RRzThDsnHB06WKlsFfz9mRX8_Zq3q7mS-x-jUG54IyQbPZ4VdxjAk-2j_j_gleURZF-</recordid><startdate>20210201</startdate><enddate>20210201</enddate><creator>Sai Guru Srinivasan, S.</creator><creator>Govardhanan, B.</creator><creator>Ashok, M.</creator><creator>Santhosh Kumar, M.C.</creator><general>Elsevier B.V</general><general>Elsevier BV</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20210201</creationdate><title>Influence of deposition time on the visible-light-driven photocatalytic activity of Cu2O thin films by reactive sputtering at room temperature</title><author>Sai Guru Srinivasan, S. ; Govardhanan, B. ; Ashok, M. ; Santhosh Kumar, M.C.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c400t-fc21489eebbaca238b23e702457426b44aef067c1f1164a788514f1ab116af7d3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Catalytic activity</topic><topic>Copper oxides</topic><topic>Crystal defects</topic><topic>Crystal violet</topic><topic>Crystallites</topic><topic>Cu2O thin film</topic><topic>Deposition</topic><topic>Glass substrates</topic><topic>Light irradiation</topic><topic>Materials science</topic><topic>Photocatalysis</topic><topic>Photodegradation</topic><topic>Pollutants</topic><topic>Radio frequency</topic><topic>Reactive sputtering</topic><topic>Room temperature</topic><topic>Sputtering</topic><topic>Surface roughness</topic><topic>Thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Sai Guru Srinivasan, S.</creatorcontrib><creatorcontrib>Govardhanan, B.</creatorcontrib><creatorcontrib>Ashok, M.</creatorcontrib><creatorcontrib>Santhosh Kumar, M.C.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Materials letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Sai Guru Srinivasan, S.</au><au>Govardhanan, B.</au><au>Ashok, M.</au><au>Santhosh Kumar, M.C.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Influence of deposition time on the visible-light-driven photocatalytic activity of Cu2O thin films by reactive sputtering at room temperature</atitle><jtitle>Materials letters</jtitle><date>2021-02-01</date><risdate>2021</risdate><volume>284</volume><spage>128980</spage><pages>128980-</pages><artnum>128980</artnum><issn>0167-577X</issn><eissn>1873-4979</eissn><abstract>•Single-phase Cu2O thin films are deposited by reactive RF magnetron sputtering.•The films are sputtered at various deposition time from 1 min to 5 min.•The physical and chemical characterization of deposited Cu2O thin films are studied.•Photodegradation of crystal violet by Cu2O thin film are reported for the first time.•The films sputtered at lower deposition time exhibit enhanced photocatalytic activity.
Nanocrystalline single-phase Cu2O thin films were deposited on a glass substrate by radio frequency (RF) reactive sputtering at room temperature with various deposition time of 1, 3 and 5 min. Films are in the cubic crystalline phase. Crystallite size increases from 16 to 22 nm and the surface roughness also found to increase from 1.8 to 2.3 nm with deposition time. XPS results denote that the defects in the films at lower deposition time predominantly attributed to oxygen vacancy. Optical band gap is found to decrease from 2.54 to 2.12 eV. The films were subjected to photocatalytic degradation of organic pollutant crystal violet. Cu2O thin films showed an excellent photocatalytic activity under visible light irradiation. Films sputtered at the lowest deposition time of 1 min exhibited higher degradation efficiency of 94%.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.matlet.2020.128980</doi></addata></record> |
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| subjects | Catalytic activity Copper oxides Crystal defects Crystal violet Crystallites Cu2O thin film Deposition Glass substrates Light irradiation Materials science Photocatalysis Photodegradation Pollutants Radio frequency Reactive sputtering Room temperature Sputtering Surface roughness Thin films |
| title | Influence of deposition time on the visible-light-driven photocatalytic activity of Cu2O thin films by reactive sputtering at room temperature |
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