Search Results - van Langen-Suurling, Anja K.

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    Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography

    Hydrogen silsesquioxane/novolak bilayer resist for high aspect ratio nanoscale electron-beam lithography by van Delft, Falco C. M. J. M., Weterings, Jos P., van Langen-Suurling, Anja K., Romijn, Hans

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