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Search Results - Weilnboeck, Florian
Search Results - Weilnboeck, Florian
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Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment
by
Nest, Dustin
,
Chung, Ting-Ying
,
Graves, David B.
,
Engelmann, Sebastian
,
Bruce, Robert L.
,
Weilnboeck, Florian
,
Oehrlein, Gottlieb S.
,
Wang, Deyan
,
Andes, Cecily
,
Hudson, Eric A.
Published in
Plasma processes and polymers
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Ion and Vacuum Ultraviolet Photon Beam Effects in 193 nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group
by
Chung, Ting-Ying
,
Graves, David B.
,
Weilnboeck, Florian
,
Bruce, Robert L.
,
Oehrlein, Gottlieb S.
,
Li, Mingqi
,
Hudson, Eric A.
Published in
Plasma processes and polymers
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He plasma pretreatment of organic masking materials for performance improvement during pattern transfer by plasma etching
by
Metzler, Dominik
,
Weilnboeck, Florian
,
Engelmann, Sebastian
,
Bruce, Robert L.
,
Oehrlein, Gottlieb S.
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer
by
Metzler, Dominik
,
Weilnboeck, Florian
,
Hernández, Sandra C.
,
Walton, Scott G.
,
Bruce, Robert L.
,
Engelmann, Sebastian
,
Salamanca-Riba, Lourdes
,
Oehrlein, Gottlieb S.
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Differences in erosion mechanism and selectivity between Ti and TiN in fluorocarbon plasmas for dielectric etch
by
Weilnboeck, Florian
,
Bartis, Elliot
,
Shachar, Sivan
,
Oehrlein, Gottlieb S.
,
Farber, David
,
Lii, Tom
,
Lenox, Chet
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Ion and Vacuum Ultraviolet Photon Beam Effects in 193nm Photoresist Surface Roughening: The Role of the Adamantyl Pendant Group
by
Chung, Ting-Ying
,
Graves, David B
,
Weilnboeck, Florian
,
Bruce, Robert L
,
Oehrlein, Gottlieb S
,
Li, Mingqi
,
Hudson, Eric A
Published in
Plasma processes and polymers
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Poly(2-vinylnaphthalene)-block-poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etching
by
Zhang, Xin
,
Metting, Christopher J.
,
Briber, Robert M.
,
Weilnboeck, Florian
,
Shin, Sang Hak
,
Jones, Benjamin G.
,
Oehrlein, Gottlieb S.
Published in
Macromolecular chemistry and physics
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Poly(2-vinylnaphthalene)-block-poly(acrylic acid) Block Copolymer: Self-Assembled Pattern Formation, Alignment, and Transfer into Silicon via Plasma Etchinga
by
XIN ZHANG
,
METTING, Christopher J
,
BRIBER, Robert M
,
WEILNBOECK, Florian
,
SHIN, Sang Hak
,
JONES, Benjamin G
,
OEHRLEIN, Gottlieb S
Published in
Macromolecular chemistry and physics
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Dependence of Polymer Surface Roughening Rate on Deposited Energy Density During Plasma Processing
by
Engelmann, Sebastian
,
Bruce, Robert L.
,
Weilnboeck, Florian
,
Oehrlein, Gottlieb S.
,
Nest, Dustin
,
Graves, David B.
,
Andes, Cecily
,
Hudson, Eric A.
Published in
Plasma processes and polymers
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