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Understanding 3D anisotropic reactive ion etching of oxide-metal stacks
by
Golani, Prafful
,
Tirukkonda, Roshan J.
,
Fancher, Aaron N.
,
Ross, Stephen R.
,
Kraman, Mark D.
,
Sharangpani, Rahul
,
Nag, Joyeeta
,
Sondhi, Kartik
,
Bogdanov, Alexei L.
,
Kanakamedala, Senaka K.
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling
by
Tirukkonda, Roshan J.
,
Kraman, Mark D.
,
Sharangpani, Rahul
,
Sondhi, Kartik
,
Fancher, Aaron N.
,
Ross, Stephen R.
,
Nag, Joyeeta
,
Bogdanov, Alexei L.
,
Makala, Raghuveer S.
,
Kanakamedala, Senaka K.
Published in
Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
by
Sondhi, Kartik
,
Sharangpani, Rahul
,
Tirukkonda, Roshan
,
Nag, Joyeeta
,
Guo, Xing-Cai
,
Gribelyuk, Michael A.
,
Makala, Raghuveer S.
,
Kanakamedala, Senaka
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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Aip 美国物理联合会现刊(与Nstl共建)
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