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Patterned wafer defect density analysis of step and flash imprint lithography
by
McMackin, I.
,
Martin, W.
,
Perez, J.
,
Selinidis, K.
,
Maltabes, J.
,
Xu, F.
,
Resnick, D.
,
Sreenivasan, S. V.
Published in
Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena
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In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation
by
Mantese, L
,
Selinidis, K
,
Wilson, P.T
,
Lim, D
,
Jiang, Y.Y
,
Ekerdt, J.G
,
Downer, M.C
Published in
Applied surface science
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Stepper registration analysis using Monte Carlo modeling
by
Waldo, W.G.
,
Selinidis, K.
,
Espenscheid, A.
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In situ control and monitoring of doped and compositionally graded SiGe films using spectroscopic ellipsometry and second harmonic generation
by
MANTESE, L
,
SELINIDIS, K
,
WILSON, P. T
,
LIM, D
,
JIANG, Y. Y
,
EKERDT, J. G
,
DOWNER, M. C
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Nonlinear optics and spectroscopic ellipsometry as complementary sensors to monitor and control SiGe growth
by
Montese, L.
,
Wilson, P.T.
,
Selinidis, K.
,
Lim, D.
,
Jiang, Y.
,
Canterbury, J.D.
,
Ekerdt, J.G.
,
Downer, M.C.
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Conference Proceeding
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