Search Results - Ramkrichnan, Ayothia

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    Novel EUV Resist Materials and Process for 20 nm Half Pitch and Beyond

    Novel EUV Resist Materials and Process for 20 nm Half Pitch and Beyond by Inukai, Koji, Maruyama, Ken, Kawakami, Takanori, Ramkrichnan, Ayothia, Hishiro, Yoshi, Kimura, Tooru

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