Search Results - Ohimi, Tadahiro

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    Erratum: “Angle-resolved phototelectron study on the structures of silicon nitride films and Si3N4/Si interfaces formed using nitrogen-hydrogen radicals” [J. Appl. Phys. 104, 114112 (2008)]

    Erratum: “Angle-resolved phototelectron study on the structures of silicon nitride films and Si3N4/Si interfaces formed using nitrogen-hydrogen radicals” [J. Appl. Phys. 104, 11411... by Aratani, Takashi, Higuchi, Masaaki, Sugawa, Shigetoshi, Ikenaga, Eiji, Ushio, Jiro, Nohira, Hiroshi, Suwa, Tomoyuki, Teramoto, Akinobu, Ohimi, Tadahiro, Hattori, Takeo

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    Erratum: "Angle-resolved phototelectron study on the structures of silicon nitride films and Si 3 N 4 / Si interfaces formed using nitrogen-hydrogen radicals" [ J. Appl. Phys. 104 , 114112 ( 2008 ) ]

    Erratum: "Angle-resolved phototelectron study on the structures of silicon nitride films and Si 3 N 4 / Si interfaces formed using nitrogen-hydrogen radicals" [ J. Appl. Phys. 104... by Aratani, Takashi, Higuchi, Masaaki, Sugawa, Shigetoshi, Ikenaga, Eiji, Ushio, Jiro, Nohira, Hiroshi, Suwa, Tomoyuki, Teramoto, Akinobu, Ohimi, Tadahiro, Hattori, Takeo

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