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Localized germanium-on-insulator patterns on Si by novel etching scheme in CF4/O2 plasma
by
RAMANA MURTHY, B
,
BALASUBRAMANIAN, N
,
BALAKUMAR, S
,
MUKHERJEE-ROY, M
,
TRIGG, A
,
KUMAR, R
,
KWONG, D. L
Published in
Thin solid films
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A dual-strained CMOS structure through simultaneous formation of relaxed and compressive strained-SiGe-on-insulator
by
Bera, L.K.
,
Mukherjee-Roy, M.
,
Abidha, B.
,
Agarwal, A.
,
Loh, W.Y.
,
Tung, C.H.
,
Kumar, R.
,
Trigg, A.D.
,
Foo, Y.L.
,
Tripathy, S.
,
Lo, G.Q.
,
Balasubramanian, N.
,
Kwong, D.L.
Published in
IEEE electron device letters
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Reactive ion etching and characterization of p-silk ultra low-k film
by
Murthy, B.R.
,
Mukherjee-Roy, M.
,
Krishnamoorthy, A.
,
Frye, D.C.
Published in
IEEE transactions on semiconductor manufacturing
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A Dual BARC method for Lithography and Etch for Dual Damascene with Low K
by
Roy, Moitreyee
,
Bliznetsov, Vladimir
,
Samudra, Ganesh
Published in
Japanese Journal of Applied Physics
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Eliminating Sidewall Damage During Etch Process for Ultra Low- k Film
by
Badam, Ramana Murthy
,
Mukherjee-Roy, Moitreyee
,
Shaoyu, Wu
,
Naman, Ananth
Published in
Japanese Journal of Applied Physics
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A new approach for eliminating unwanted patterns in attenuated phase shift masks
by
Mukherjee-Roy, M.
,
Singh, N.
,
Mehta, S.S.
,
Samudra, G.S.
Published in
Microelectronics
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Localized germanium-on-insulator patterns on Si by novel etching scheme in CF 4/O 2 plasma
by
Ramana Murthy, B.
,
Balasubramanian, N.
,
Balakumar, S.
,
Mukherjee-Roy, M.
,
Trigg, A.
,
Kumar, R.
,
Kwong, D.L.
Published in
Thin solid films
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A Two-Step Oxidation Mediated Condensation Process for Ultrathin High Ge Content SiGe Epitaxial Films on Insulator
by
Mukherjee-Roy, M.
,
Agarwal, A.
,
Balakumar, S.
,
Du, A. Y.
,
Trigg, A. D.
,
Kumar, R.
,
Balasubramanian, N.
,
Kwong, D. L.
Published in
Electrochemical and solid-state letters
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Defocusing image to pattern contact holes using attenuated phase shift masks
by
Singh, Navab
,
Mukherjee-Roy, Moitreyee
,
Mehta, Sohan Singh
Published in
Microelectronics
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Resist pattern peeling assessment in DUV chemically amplified resist
by
Mehta, Sohan Singh
,
Qin, Sun Hai
,
Mukherjee-Roy, Moitreyee
,
Singh, Navab
,
Kumar, Rakesh
Published in
Microelectronics
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Placement of scattering bars in binary and attenuated phase shift mask for damascene trench patterning
by
Singh Mehta, Sohan
,
Singh, Navab
,
Mukherjee-Roy, Moitreyee
,
Kumar, Rakesh
Published in
Microelectronics
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