Search Results - Molzen, W.W.

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  1. 1
    Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography

    Determination of proximity effect correction parameters for 0.1 μm electron-beam lithography by Rosenfield, M.G., Wind, S.J., Molzen, W.W., Gerber, P.D.

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  2. 2
    A fully scaled submicrometer NMOS technology using direct-write E-beam lithography

    A fully scaled submicrometer NMOS technology using direct-write E-beam lithography by Wordeman, M.R., Schweighart, A.M., Dennard, R.H., Sai-Halasz, G., Molzen, W.W.

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  3. 3
    Gradient-based optimization of custom circuits using a static-timing formulation

    Gradient-based optimization of custom circuits using a static-timing formulation by Conn, A.R., Elfadel, I.M., Molzen, W.W., O'Brien, P.R., Strenski, P.N., Visweswariah, C., Whan, C.B.

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  4. 4
    NiFe films deposited by sputter gun and applications to bubble devices

    NiFe films deposited by sputter gun and applications to bubble devices by Tao, L.J., Ahn, K.Y., Lin, B.J., Molzen, W.W.

    Published in Thin solid films
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