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A Millisecond-Anneal-Assisted Selective Fully Silicided (FUSI) Gate Process
by
Da-Wen Lin
,
Wang, M.
,
Ming-Lung Cheng
,
Yi-Ming Sheu
,
Tarng, B.
,
Che-Min Chu
,
Chun-Wen Nieh
,
Chia-Ping Lo
,
Wen-Chi Tsai
,
Lin, R.
,
Shyh-Wei Wang
,
Kuan-Lun Cheng
,
Chii-Ming Wu
,
Ming-Ta Lei
,
Chung-Cheng Wu
,
Diaz, C.H.
,
Ming-Jer Chen
Published in
IEEE electron device letters
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A new and improved borderless contact (BLC) structure for high-performance Ti-salicide in sub-quarter micron CMOS devices
by
Liu, Wen-Chau
,
Thei, Kong-Beng
,
Wang, Wei-Chou
,
Pan, Hsi-Jen
,
Wuu, Shou-Gwo
,
Lei, Ming-Ta
,
Wang, Chung-Shu
,
Cheng, Shiou-Ying
Published in
IEEE electron device letters
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