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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH4–N2 plasma at room temperature
by
Lee, Hwajune
,
Kim, Byungwhan
,
Kwon, Sanghee
Published in
Current applied physics
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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH(4)-N(2) plasma at room temperature
by
Lee, Hwajune
,
Kim, Byungwhan
,
Kwon, Sanghee
Published in
Current applied physics
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Radio frequency source power-induced ion energy impact on SiN films deposited by using a pulsed-PECVD in SiH 4–N 2 plasma at room temperature
by
Lee, Hwajune
,
Kim, Byungwhan
,
Kwon, Sanghee
Published in
Current applied physics
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MODELING OF THIN FILM PROCESS DATA USING A GENETIC ALGORITHM-OPTIMIZED INITIAL WEIGHT OF BACKPROPAGATION NEURAL NETWORK
by
Kim, Byungwhan
,
Lee, Hwajune
,
Kim, Donghwan
Published in
Applied artificial intelligence
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Current Applied Physics
3 results
3
Applied Artificial Intelligence
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Subjects
Deposition Rate
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2
Ion Bombardment
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2
Ion Energy
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2
Ion Energy Flux
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2
Pulsed-Plasma Enhanced Chemical Vapor Deposition
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Radio Frequency Source Power
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Room Temperatures
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Silicon Nitride Film
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Anisotropy
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Computer Science
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Computer Science, Artificial Intelligence
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Engineering
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Engineering, Electrical & Electronic
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Genetic Algorithms
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Neural Networks
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Plasma Etching
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Science & Technology
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Sih
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Sih 4–N 2
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Silica
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Sciencedirect Journals
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Taylor & Francis Open Access
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Ebscohost Business Source Ultimate
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Doaj Directory Of Open Access Journals
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Science Citation Index Expanded (Web Of Science)
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Ingentaconnect Journals
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Taylor & Francis Engineering, Computing & Technology Archive
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