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Effect of thin-film imaging on line edge roughness transfer to underlayers during etch processes
by
Goldfarb, Dario L.
,
Mahorowala, Arpan P.
,
Gallatin, Gregg M.
,
Petrillo, Karen E.
,
Temple, Karen
,
Angelopoulos, Marie
,
Rasgon, Stacy
,
Sawin, Herbert H.
,
Allen, Scott D.
,
Lawson, Margaret C.
,
Kwong, Ranee W.
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Track process monitoring via laser scattering imaging
by
Meli, Luciana
,
Kwong, Ranee
,
Murray, Cody J.
,
Petrillo, Karen E.
,
Hubbard, Alex R.
,
Dhagat, Parul
,
Macnish, Shawn
,
Palamadai, Chandar
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Integration of Photo-Patternable Low-$\kappa$ Material into Advanced Cu Back-End-Of-The-Line
by
Lin, Qinghuang
,
Nelson, Alshakim
,
Chen, Shyng-Tsong
,
Brock, Philip
,
Cohen, Stephan A
,
Davis, Blake
,
Kaplan, Richard
,
Kwong, Ranee
,
Liniger, Eric
,
Neumayer, Debra
,
Patel, Jyotica
,
Shobha, Hosadurga
,
Sooriyakumaran, Ratnam
,
Purushothaman, Sampath
,
Miller, Robert
,
Spooner, Terry
,
Wisnieff, Robert
Published in
Japanese Journal of Applied Physics
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KRS: An Environmentally Robutst Resist Based on Fast Reaction kinetics
by
Huang, Wu-Song
,
Katnani, Ahmad D.
,
Yang, Dominic
,
Brunsvold, Bill
,
Bantu, Rao
,
Khojasteh, Mahmoud
,
Sooriyakumaran, R.
,
Kwong, Ranee
,
Lee, Kim Y.
,
Hefferon, George
,
Orsula, George
,
Cameron, Jim
,
Denison, Mark
,
Sinta, Roger
,
Thackeray, Jim
Published in
Journal of photopolymer science and technology
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KRS: An Environmentally Robust Resist Based on Fast Reaction Kinetics
by
Huang, Wu-Song
,
Katnani, Ahmad D.
,
Yang, Dominic
,
Brunsvold, Bill
,
Bantu, Rao
,
Khojasteh, Mahmoud
,
Sooriyakumaran, R.
,
Kwong, Ranee
,
Lee, Kim Y.
,
Hefferon, George
,
Orsula, George
,
Cameron, Jim
,
Denison, Mark
,
Sinta, Roger
,
Thackeray, Jim
Published in
Journal of Photopolymer Science and Technology
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