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Statistics of electromigration early failures in Cu/oxide dual-damascene interconnects
by
Ogawa, E.T.
,
Lee, K.-D.
,
Matsuhashi, H.
,
Ko, K.-S.
,
Justison, P.R.
,
Ramamurthi, A.N.
,
Bierwag, A.J.
,
Ho, P.S.
,
Blaschke, V.A.
,
Havemann, R.H.
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Conference Proceedings
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Subjects
Atherosclerosis
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Cu Interconnects
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Dual-Damascene
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Early Failure
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Electromigration
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Engineering
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Engineering, Electrical & Electronic
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Grain Boundaries
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Interconnect Reliability
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Joining Processes
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Laboratories
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Metallization
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Packaging
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Physical Sciences
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Physics
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Physics, Applied
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Reliability
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Science & Technology
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Statistics
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Surface Resistance
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Ieee Electronic Library (Iel) Conference Proceedings
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