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    Improving the etching performance of high-aspect-ratio contacts by wafer temperature control: Uniform temperature design and etching rate enhancement

    Improving the etching performance of high-aspect-ratio contacts by wafer temperature control: Uniform temperature design and etching rate enhancement by Tandoua, Takumi, Kubob, Seiji, Yokogawaa, Ken'etsu, Negishia, Nobuyuki, Izawaa, Masaru

    Published in Precision engineering
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