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Reduction of metal contact resistance of graphene devices via CO2 cluster cleaning
by
Gahng, Sarang
,
Ho Ra, Chang
,
Jin Cho, Yu
,
Ah Kim, Jang
,
Kim, Taesung
,
Jong Yoo, Won
Published in
Applied physics letters
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Applied Physics Letters
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Subjects
Applied Physics
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Carbon Dioxide
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Chemical Vapor Deposition
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Cleaning
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Clusters
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Contact Resistance
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Energy Transfer
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Field Effect Transistors
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Flow Velocity
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Graphene
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Organic Chemistry
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Photoresists
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Physical Sciences
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Physics
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Physics, Applied
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Polymethyl Methacrylate
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Reduction
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Science & Technology
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Semiconductor Devices
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Shrinkage
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American Institute Of Physics:jisc Collections:transitional Journals Agreement 2021-23 (Reading List)
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American Institute Of Physics
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