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    Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization

    Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization by Pons, M, Baillet, F, Blanquet, E, Pernot, E, Madar, R, Chaussende, D, Mermoux, M, Di Coccio, L, Ferret, P, Feuillet, G, Faure, C, Billon, Th

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    Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization

    Vapor phase techniques for the fabrication of homoepitaxial layers of silicon carbide: process modeling and characterization by PONS, M, BAILLET, F, FAURE, C, BILLON, Th, BLANQUET, E, PERNOT, E, MADAR, R, CHAUSSENDE, D, MERMOUX, M, DI COCCIO, L, FERRET, P, FEUILLET, G

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