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Search Results - Collison, Wenli Z.
Search Results - Collison, Wenli Z.
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A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
by
Kushner, Mark J.
,
Collison, Wenli Z.
,
Grapperhaus, Michael J.
,
Holland, John P.
,
Barnes, Michael S.
Published in
Journal of applied physics
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HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy
by
Chou, Shang-I
,
Baer, Douglas S.
,
Hanson, Ronald K.
,
Collison, Wenli Z.
,
Ni, Tom Q.
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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Ion drag effects in inductively coupled plasmas for etching
by
Collison, Wenli Z.
,
Kushner, Mark J.
Published in
Applied physics letters
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Conceptual design of advanced inductively coupled plasma etching tools using computer modeling
by
Collison, W.Z.
,
Kushner, M.J.
Published in
IEEE transactions on plasma science
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A 3-dimensional model for inductively coupled plasma etching reactors: coil generated plasma asymmetries
by
Kushner, M.J.
,
Collison, W.Z.
,
Grapperhaus, M.J.
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