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Search Results - Collison, Wenli
Search Results - Collison, Wenli
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Enabling 300 mm Wafer-Scale Fabrication of Superconducting Quantum Devices
by
Bhatia, Ekta
,
Frost, Hunter
,
Pieniazek, Nicholas
,
Nalaskowski, Jakub
,
Mucci, John
,
Collison, Wenli
,
Martinick, Brian
,
Telhu, Geevanie
,
Egan, Bryan
,
Olson, Stephen
,
Hung, Pui-Yee
,
Wells, Ilyssa
,
Johnson, Corbet
,
Murray, Thomas
,
Musick, Kevin
,
Rao, Satyavolu Papa
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A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments
by
Kushner, Mark J.
,
Collison, Wenli Z.
,
Grapperhaus, Michael J.
,
Holland, John P.
,
Barnes, Michael S.
Published in
Journal of applied physics
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HBr concentration and temperature measurements in a plasma etch reactor using diode laser absorption spectroscopy
by
Chou, Shang-I
,
Baer, Douglas S.
,
Hanson, Ronald K.
,
Collison, Wenli Z.
,
Ni, Tom Q.
Published in
Journal of vacuum science & technology. A, Vacuum, surfaces, and films
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Ion drag effects in inductively coupled plasmas for etching
by
Collison, Wenli Z.
,
Kushner, Mark J.
Published in
Applied physics letters
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STI 28nm pitch guided DSA to enable the 450mm tools qualification and transition
by
Larrea, Anne-Sophie
,
Dunn, Shannon
,
Collison, Wenli
,
Franca, Daniel
,
Borst, Christopher
,
Lee, Janghee
,
Lim, JongHeun J H
,
Chang, Stock
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Critical dimension control of a plasma etch process by integrating feedforward and feedback run-to-run control
by
El Chemali, Chadi
,
Freudenberg, Jim
,
Hankinson, Matt
,
Collison, Wenli
,
Ni, Tom
Published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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Conceptual design of advanced inductively coupled plasma etching tools using computer modeling
by
Collison, W.Z.
,
Kushner, M.J.
Published in
IEEE transactions on plasma science
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Opportunities and challenges of the 450mm transition
by
Lin, John
,
Pinyen Lin
,
Wen-Yu Ku
,
Kelling, Mark C.
,
Akiki, Greg
,
Sangdong Kwon
,
Kwangwook Lee
,
Collison, Wenli
,
Chang, Stock
,
Cottle, Rand
,
Yu-Chih Wang
,
Borst, Christopher
,
Skilbred, David
,
Robertson, Frank
,
Farrar, Paul
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A 3-dimensional model for inductively coupled plasma etching reactors: coil generated plasma asymmetries
by
Kushner, M.J.
,
Collison, W.Z.
,
Grapperhaus, M.J.
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