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14Effect of surface NH3 anneal on the physical and electrical properties of HfO2 films on Ge substrateby Wu, Nan, Zhang, Qingchun, Zhu, Chunxiang, Yeo, Chia Chin, Whang, S. J., Chan, D. S. H., Li, M. F., Cho, Byung Jin, Chin, Albert, Kwong, Dim-Lee, Du, A. Y., Tung, C. H., Balasubramanian, N.Get full text
Published in Applied physics letters
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