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Yu, Bao
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Institute Of Physics:nesli2:Science Extra Platform (Option 2):2014
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Search Results - Yu, Bao
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Yu, Bao
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A new cleaning process for the metallic contaminants on a post-CMP wafer's surface
by
高宝红 刘玉岭 王辰伟 朱亚东
Published in
Journal of semiconductors
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902
A new cleaning process combining non-ionic surfactant with diamond film electrochemical oxidation for polished silicon wafers
by
高宝红 朱亚东 刘玉岭 王胜利 周强 刘效岩
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Journal of semiconductors
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903
吲唑、3-卤代吲唑互变异构反应机理的理论研究
by
于海艳
,
李宝宗
,
国永敏
Published in
化学物理学报
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Chinese Physics Letters
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Institute Of Physics:nesli2:Science Extra Platform (Option 2):2014
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